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Ultrapure Water System for Microchip Manufacturing

AMI custom engineered water treatment system to supply ultrapure water for use in rinse water for microchip manufacturing in Hua Yue Microelectronics in China. Installation includes 2-pass reverse osmosis and microfiltration system and is complete with pretreatment, ozone, degassifiers, ultraviolet disinfection, and mixed bed deionization.

Flow Rate 300 GPM 1,136 LPM 1,635 M3/Day China 1996
Application Microelectronics and Semiconductor Rinse Water

Technologies Used

  • Ozone
  • Hydrocyclone
  • Media Filtration
  • Reverse Osmosis
  • Membrane Degassifiers
  • Mixed Bed DI
  • Ultraviolet Disinfection
  • Microfiltration

Special Features

  • 2-Pass RO Systems
  • Product water requirements:
    • Resistivity = 17.5 megaohms/cm
    • TOC < 100 ppb
    • DO2 < 100 ppb
    • SiO2 < 5 ppb
    • Microorganisms < 50/100 mL
  • PVDF Piping